USHIO EPITEX INC. is a leading manufacturer of Photo Sensor and Custom LED in Kyoto, Japan.
 
Trade mark
USHIO EPITEX INC.
Head office location
66-3, Minamikawabe-Cho, Higashi-Kujyou, Minami-Ku, Kyoto, Japan
Tel: ++81-75-682-2338 Fax:++81-75-682-2267
E-mail : sales-dep@epitex.com
Web site : http://www.epitex.com/
Establishment data
07/1989
Capital
20,000,000
Yearly turnover
1.1 billion yen FY2014
Employee
Twenty-seven persons
Correspondent bank
Sumitomo Mitsui Banking Corporation, Kuzuha Branch
UFJ Banking Corporation, Kyotoekimae Branch
Tokyo Mitsubishi Banking Corporation, Kyoto Branch
Map
 


 
Research, development and production of Opto-sensor and Custom LED
Sales worldwide of semiconductor material and LED
Sales of semiconductor manufacturing equipment (III/V and II/VI)
1989
Research & development of LEDs was started at Hirakata-city, Osaka
1990
SiC Blue LED was successful in reserch and development
1991
High Power IR LED commenced production
1992
Visible sensor of GaAlAs current-confined type was developed
1993
Full color(RGB) dot-matrix display commenced production
1.3μm InP-LED commenced mass prodution
Ultra-bright Red LED started mass production
1994
Sensor-use LED lamp started production on automatic assembly line
1.3μm InGaAs Photodiode was succsessful in development
1997
High speed and High power IR LED was developed
1998
Bicolor LED started production
Chip LED of SMD type(SMC) started production
Multi-wavelength LED including 975nm for medical use started production
Top flat type of mold LED started production
CCD chip process was renewed successfuly
2000
New type of SMD in plastic package (COB) started production
2002
TOP LED started for production
2005
We acquired ISO9001:2000
2007
Moove to new building.
2009
MO-CVD installed for AlGaN growth
2010
Green Partner honored, ISO 14001
2013
Silicone resin transfer installed for LED assembly
2015
16/June/2015 Changed the corporate name of EPITEX INC. to USHIO EPITEX INC.


 
State-of-the art LPE mass-production - Original design equipment
High R&D capability in opto^sensors and custom LED-Development and innovation
Additional R&D facility and equipment for optoelectronics devices
A leader in both production and R&D - Over 30 years experience of related technology in III-V semiconductors


 
Original design equipment - High quality GaAlAs (DDH) epitaxial growth
Sophisticated chip process
First to achieve mass production capability in GaAlAs (DDH) chip
Improved radiant intensity of GaAlAs (DDH) LED lamp with revolutionary
New technology - Intensity is improved by precision assembly technology


 
Advanced mass production reduces production cost - Multi-wafer epitaxy capability for GaAlAs (DDH)
Experienced engineering for best customer support - Ability ti 'work with customer' for product innovation and new applications
Geared for expansion to meet rising demand
Technical collaboration with leading edge customers


 
Production Line (Epitaxial growth)
-LPE epitaxial growth equipment - Evaporatir
-Electron beam evaporator
-Plasma Chemical Vapour Deposition equipment
-Radio frequency source -Thermal treatment furnace
Assembly Line (Chip process, resin molding)
-Fully automatic die bonder
-Fully automatic wire bonder
-Manual wire bonder
-Automatic epoxy dispenser
-Ovens
Evaluation
-Photoluminescence
-Ellipsometer
-Surface step measuring machine
-Carrier concentration profiler
-Curve tracer
-Automatic wafer probing machine
Quality Control
-Optical spectrum analyzer
-Metal microscope
-Microscope
-High speed digitizing oscilloscope
-Pulse/Function generator
-Curve tracer
-LED Chip sorter
-LED Lamp sorter
-Powermeter (with integrating sphere)
-Photometer (brightness measurement)
Utilities
-RO method-ultra pure water supplier
-Oil-free rotary compressor
-Hydrogen gas purifier
-Nitrogen gas purifier